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Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits
This article discusses the transition of a form of nanoimprint lithography technology, known as Jet and Flash Imprint Lithography (J-FIL), from research to a commercial fabrication infrastructure for leading-edge semiconductor integrated circuits (ICs). Leading-edge semiconductor lithography has som...
Gorde:
| Argitaratua izan da: | Microsyst Nanoeng |
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| Egile nagusia: | |
| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Nature Publishing Group
2017
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| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6445000/ https://ncbi.nlm.nih.gov/pubmed/31057889 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/micronano.2017.75 |
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