Sreenivasan, S. (2017). Nanoimprint lithography steppers for volume fabrication of leading-edge semiconductor integrated circuits. Microsyst Nanoeng.
Citação norma ChicagoSreenivasan, S.V. "Nanoimprint Lithography Steppers for Volume Fabrication of Leading-edge Semiconductor Integrated Circuits." Microsyst Nanoeng 2017.
Citação norma MLASreenivasan, S.V. "Nanoimprint Lithography Steppers for Volume Fabrication of Leading-edge Semiconductor Integrated Circuits." Microsyst Nanoeng 2017.
Nota: a formatação da citação pode não corresponder 100% ao definido pela respectiva norma.