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Controlling the Polarity of the Molecular Beam Epitaxy Grown In-Bi Atomic Film on the Si(111) Surface

Synchrotron radiation core-level photoemission spectroscopy, scanning tunneling microscopy (STM), and first-principles calculations have been utilized to explore the growth processes and the atomic structure of the resulting films during the two-step molecular beam epitaxy (MBE) of In and Bi on the...

詳細記述

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書誌詳細
出版年:Sci Rep
主要な著者: Lin, Cho-Ying, Hsu, Chia-Hsiu, Huang, Yu-Zhang, Hsieh, Shih-Ching, Chen, Han-De, Huang, Li, Huang, Zhi-Quan, Chuang, Feng-Chuan, Lin, Deng-Sung
フォーマット: Artigo
言語:Inglês
出版事項: Nature Publishing Group UK 2019
主題:
オンライン・アクセス:https://ncbi.nlm.nih.gov/pmc/articles/PMC6345972/
https://ncbi.nlm.nih.gov/pubmed/30679630
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-37051-2
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