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Step-Double-Zone-JTE for SiC Devices with Increased Tolerance to JTE Dose and Surface Charges

In this paper, an edge termination structure, referred to as step-double-zone junction termination extension (Step-DZ-JTE), is proposed. Step-DZ-JTE further improves the distribution of the electric field (EF) by its own step shape. Step-DZ-JTE and other termination structures are investigated for c...

詳細記述

保存先:
書誌詳細
出版年:Micromachines (Basel)
主要な著者: Huang, Yifei, Wang, Ying, Kuang, Xiaofei, Wang, Wenju, Tang, Jianxiang, Sun, Youlei
フォーマット: Artigo
言語:Inglês
出版事項: MDPI 2018
主題:
オンライン・アクセス:https://ncbi.nlm.nih.gov/pmc/articles/PMC6315798/
https://ncbi.nlm.nih.gov/pubmed/30469458
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi9120610
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