Nalaganje...
Insights into the Role of Plasma in Atmospheric Pressure Chemical Vapor Deposition of Titanium Dioxide Thin Films
In this work, the effect of plasma on the chemistry and morphology of coatings deposited by Atmospheric Pressure Plasma Enhanced Chemical Vapor Deposition (AP-PECVD) is investigated. To do so, plasma deposited amorphous titanium dioxide (TiO(2)) thin films are compared to thin films deposited using...
Shranjeno v:
| izdano v: | Sci Rep |
|---|---|
| Main Authors: | , , , |
| Format: | Artigo |
| Jezik: | Inglês |
| Izdano: |
Nature Publishing Group UK
2018
|
| Teme: | |
| Online dostop: | https://ncbi.nlm.nih.gov/pmc/articles/PMC6232178/ https://ncbi.nlm.nih.gov/pubmed/30420716 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-35154-4 |
| Oznake: |
Označite
Brez oznak, prvi označite!
|