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Stress Distribution Profile Imaging With Spectral Fabry-Perot Interferometry in Thin Layer Substrates for Surface Micromachining

We have used spectral two-layer interferometry (STLI) imaging for estimation of the stress distribution profiles (SDPs) in thin film substrates, enabling fast and reliable all-optical methodology for the evaluation of pre-stress topography profiles in silicon wafers deposited with thin films. Specif...

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Detalhes bibliográficos
Publicado no:Micromachines (Basel)
Main Authors: Inzelberg, Adam, Linzon, Yoav
Formato: Artigo
Idioma:Inglês
Publicado em: MDPI 2017
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6189764/
https://ncbi.nlm.nih.gov/pubmed/30400485
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/mi8100294
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