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Reduction of the forming voltage through tailored oxygen non-stoichiometry in tantalum oxide ReRAM devices

In this study, we investigated the influence of oxygen non-stoichiometry on the resistive switching performance of tantalum oxide based memristive devices. Thin-films of tantalum oxide were deposited with varying sputter power and oxygen partial pressure. The electroforming voltage was found to decr...

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Detalhes bibliográficos
Publicado no:Sci Rep
Main Authors: Skaja, Katharina, Andrä, Michael, Rana, Vikas, Waser, Rainer, Dittmann, Regina, Baeumer, Christoph
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group UK 2018
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC6052165/
https://ncbi.nlm.nih.gov/pubmed/30022129
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/s41598-018-28992-9
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