Dopant Distribution in Atomic Layer Deposited ZnO:Al Films Visualized by Transmission Electron Microscopy and Atom Probe Tomography

[Image: see text] The maximum conductivity achievable in Al-doped ZnO thin films prepared by atomic layer deposition (ALD) is limited by the low doping efficiency of Al. To better understand the limiting factors for the doping efficiency, the three-dimensional distribution of Al atoms in the ZnO hos...

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Detalhes bibliográficos
Publicado no:Chem Mater
Main Authors: Wu, Yizhi, Giddings, A. Devin, Verheijen, Marcel A., Macco, Bart, Prosa, Ty J., Larson, David J., Roozeboom, Fred, Kessels, Wilhelmus M. M.
Formato: Artigo
Idioma:Inglês
Publicado em: American Chemical Society 2018
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC5833938/
https://ncbi.nlm.nih.gov/pubmed/29515290
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.chemmater.7b03501
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