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Effect of Isopropyl Alcohol Concentration and Etching Time on Wet Chemical Anisotropic Etching of Low-Resistivity Crystalline Silicon Wafer

A micropyramid structure was formed on the surface of a monocrystalline silicon wafer (100) using a wet chemical anisotropic etching technique. The main objective was to evaluate the performance of the etchant based on the silicon surface reflectance. Different isopropyl alcohol (IPA) volume concent...

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Pubblicato in:Int J Anal Chem
Autori principali: Abdur-Rahman, Eyad, Alghoraibi, Ibrahim, Alkurdi, Hassan
Natura: Artigo
Lingua:Inglês
Pubblicazione: Hindawi 2017
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Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC5554996/
https://ncbi.nlm.nih.gov/pubmed/28831284
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1155/2017/7542870
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