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Frequency-Stable Ionic-Type Hybrid Gate Dielectrics for High Mobility Solution-Processed Metal-Oxide Thin-Film Transistors

In this paper, we demonstrate high mobility solution-processed metal-oxide thin-film transistors (TFTs) by using a high-frequency-stable ionic-type hybrid gate dielectric (HGD). The HGD gate dielectric, a blend of sol-gel aluminum oxide (AlO(x)) and poly(4-vinylphenol) (PVP), exhibited high dielectr...

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Dettagli Bibliografici
Pubblicato in:Materials (Basel)
Autori principali: Heo, Jae Sang, Choi, Seungbeom, Jo, Jeong-Wan, Kang, Jingu, Park, Ho-Hyun, Kim, Yong-Hoon, Park, Sung Kyu
Natura: Artigo
Lingua:Inglês
Pubblicazione: MDPI 2017
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Accesso online:https://ncbi.nlm.nih.gov/pmc/articles/PMC5553520/
https://ncbi.nlm.nih.gov/pubmed/28772972
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma10060612
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