Silver Deposition onto Modified Silicon Substrates

Trimethylphosphine(hexafluoroacetylacetonato)silver(I) was used as a precursor to deposit silver onto silicon surfaces. The deposition was performed on silicon-based substrates including silica, H-terminated Si(100), and OH-terminated (oxidized) Si(100). The deposition processes at room temperature...

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Bibliographic Details
Published in:	J Phys Chem C Nanomater Interfaces
Main Authors:	Duan, Yichen, Rani, Sana, Zhang, Yuying, Ni, Chaoying, Newberg, John T., Teplyakov, Andrew V.
Format:	Artigo
Language:	Inglês
Published:	2017
Subjects:	Article
Online Access:	https://ncbi.nlm.nih.gov/pmc/articles/PMC5482543/ https://ncbi.nlm.nih.gov/pubmed/28652890 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.6b12896
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Silver Deposition onto Modified Silicon Substrates

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