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Silver Deposition onto Modified Silicon Substrates
Trimethylphosphine(hexafluoroacetylacetonato)silver(I) was used as a precursor to deposit silver onto silicon surfaces. The deposition was performed on silicon-based substrates including silica, H-terminated Si(100), and OH-terminated (oxidized) Si(100). The deposition processes at room temperature...
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| Vydáno v: | J Phys Chem C Nanomater Interfaces |
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| Hlavní autoři: | , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
2017
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5482543/ https://ncbi.nlm.nih.gov/pubmed/28652890 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acs.jpcc.6b12896 |
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