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Pulsed Laser Porosification of Silicon Thin Films
We present a new and simple laser-based process to porosify thin film silicon using a pulsed laser. During deposition, we incorporate gas atoms or molecules into the Si thin film. Pulsed laser radiation of wavelength [Formula: see text] heats up thin film Si beyond its melting point. Upon heating, g...
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| Publicat a: | Materials (Basel) |
|---|---|
| Autors principals: | , , , , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
MDPI
2016
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5456937/ https://ncbi.nlm.nih.gov/pubmed/28773630 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma9070509 |
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