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Pulsed Laser Porosification of Silicon Thin Films

We present a new and simple laser-based process to porosify thin film silicon using a pulsed laser. During deposition, we incorporate gas atoms or molecules into the Si thin film. Pulsed laser radiation of wavelength [Formula: see text] heats up thin film Si beyond its melting point. Upon heating, g...

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Publicat a:Materials (Basel)
Autors principals: Sämann, Christian, Köhler, Jürgen R., Dahlinger, Morris, Schubert, Markus B., Werner, Jürgen H.
Format: Artigo
Idioma:Inglês
Publicat: MDPI 2016
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Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC5456937/
https://ncbi.nlm.nih.gov/pubmed/28773630
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma9070509
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