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Characterization of High-k Nanolayers by Grazing Incidence X-ray Spectrometry
The accurate characterization of nanolayered systems is an essential topic for today’s developments in many fields of material research. Thin high-k layers and gate stacks are technologically required for the design of current and future electronic devices and can be deposited, e.g., by Atomic Layer...
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| 出版年: | Materials (Basel) |
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| 主要な著者: | , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
MDPI
2014
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5453343/ https://ncbi.nlm.nih.gov/pubmed/28788611 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma7043147 |
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