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Characterization of High-k Nanolayers by Grazing Incidence X-ray Spectrometry
The accurate characterization of nanolayered systems is an essential topic for today’s developments in many fields of material research. Thin high-k layers and gate stacks are technologically required for the design of current and future electronic devices and can be deposited, e.g., by Atomic Layer...
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| Publicado no: | Materials (Basel) |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
MDPI
2014
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5453343/ https://ncbi.nlm.nih.gov/pubmed/28788611 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma7043147 |
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