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Comprehensive Study of Lanthanum Aluminate High-Dielectric-Constant Gate Oxides for AdvancedCMOS Devices
A comprehensive study of the electrical and physical characteristics of Lanthanum Aluminate (LaAlO(3)) high-dielectric-constant gate oxides for advanced CMOS devices was performed. The most distinctive feature of LaAlO(3) as compared with Hf-based high-k materials is the thermal stability at the int...
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| Veröffentlicht in: | Materials (Basel) |
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| 1. Verfasser: | |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
MDPI
2012
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5448927/ https://ncbi.nlm.nih.gov/pubmed/28817057 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/ma5030443 |
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