Introducing Overlapping Grain Boundaries in Chemical Vapor Deposited Hexagonal Boron Nitride Monolayer Films

[Image: see text] We demonstrate the growth of overlapping grain boundaries in continuous, polycrystalline hexagonal boron nitride (h-BN) monolayer films via scalable catalytic chemical vapor deposition. Unlike the commonly reported atomically stitched grain boundaries, these overlapping grain bound...

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Julkaisussa:ACS Nano
Päätekijät: Bayer, Bernhard C., Caneva, Sabina, Pennycook, Timothy J., Kotakoski, Jani, Mangler, Clemens, Hofmann, Stephan, Meyer, Jannik C.
Aineistotyyppi: Artigo
Kieli:Inglês
Julkaistu: American Chemical Society 2017
Linkit:https://ncbi.nlm.nih.gov/pmc/articles/PMC5444048/
https://ncbi.nlm.nih.gov/pubmed/28410557
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/acsnano.6b08315
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