In Situ Observations during Chemical Vapor Deposition of Hexagonal Boron Nitride on Polycrystalline Copper

[Image: see text] Using a combination of complementary in situ X-ray photoelectron spectroscopy and X-ray diffraction, we study the fundamental mechanisms underlying the chemical vapor deposition (CVD) of hexagonal boron nitride (h-BN) on polycrystalline Cu. The nucleation and growth of h-BN layers...

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Detalhes bibliográficos
Publicado no:Chem Mater
Main Authors: Kidambi, Piran R., Blume, Raoul, Kling, Jens, Wagner, Jakob B., Baehtz, Carsten, Weatherup, Robert S., Schloegl, Robert, Bayer, Bernhard C., Hofmann, Stephan
Formato: Artigo
Idioma:Inglês
Publicado em: American Chemical Society 2014
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4311958/
https://ncbi.nlm.nih.gov/pubmed/25673919
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/cm502603n
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