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Contact electrification induced interfacial reactions and direct electrochemical nanoimprint lithography in n-type gallium arsenate wafer

Although metal assisted chemical etching (MacEtch) has emerged as a versatile micro-nanofabrication method for semiconductors, the chemical mechanism remains ambiguous in terms of both thermodynamics and kinetics. Here we demonstrate an innovative phenomenon, i.e., the contact electrification betwee...

पूर्ण विवरण

में बचाया:
ग्रंथसूची विवरण
में प्रकाशित:Chem Sci
मुख्य लेखकों: Zhang, Jie, Zhang, Lin, Wang, Wei, Han, Lianhuan, Jia, Jing-Chun, Tian, Zhao-Wu, Tian, Zhong-Qun, Zhan, Dongping
स्वरूप: Artigo
भाषा:Inglês
प्रकाशित: Royal Society of Chemistry 2017
विषय:
ऑनलाइन पहुंच:https://ncbi.nlm.nih.gov/pmc/articles/PMC5369340/
https://ncbi.nlm.nih.gov/pubmed/28451347
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1039/c6sc04091h
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