Effects of Post Annealing Treatments on the Interfacial Chemical Properties and Band Alignment of AlN/Si Structure Prepared by Atomic Layer Deposition

The influences of annealing temperature in N(2) atmosphere on interfacial chemical properties and band alignment of AlN/Si structure deposited by atomic layer deposition have been investigated based on x-ray photoelectron spectroscopy and spectroscopic ellipsometry. It is found that more oxygen inco...

Ful tanımlama

Kaydedildi:
Detaylı Bibliyografya
Yayımlandı:Nanoscale Res Lett
Asıl Yazarlar: Sun, Long, Lu, Hong-Liang, Chen, Hong-Yan, Wang, Tao, Ji, Xin-Ming, Liu, Wen-Jun, Zhao, Dongxu, Devi, Anjana, Ding, Shi-Jin, Zhang, David Wei
Materyal Türü: Artigo
Dil:Inglês
Baskı/Yayın Bilgisi: Springer US 2017
Konular:
Nano Express
Online Erişim:https://ncbi.nlm.nih.gov/pmc/articles/PMC5307488/
https://ncbi.nlm.nih.gov/pubmed/28181165
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1822-x
Etiketler: Etiketle
Etiket eklenmemiş, İlk siz ekleyin!

Benzer Materyaller