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Effects of Annealing Temperature on Properties of Ti-Ga–Doped ZnO Films Deposited on Flexible Substrates

An investigation is performed into the optical, electrical, and microstructural properties of Ti-Ga–doped ZnO films deposited on polyimide (PI) flexible substrates and then annealed at temperatures of 300 °C, 400 °C, and 450 °C, respectively. The X-ray diffraction (XRD) analysis results show that al...

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Détails bibliographiques
Publié dans:Nanomaterials (Basel)
Auteurs principaux: Chen, Tao-Hsing, Chen, Ting-You
Format: Artigo
Langue:Inglês
Publié: MDPI 2015
Sujets:
Accès en ligne:https://ncbi.nlm.nih.gov/pmc/articles/PMC5304781/
https://ncbi.nlm.nih.gov/pubmed/28347098
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.3390/nano5041831
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