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Atom Diffusion and Evaporation of Free-Ended Amorphous SiO(x) Nanowires: Nanocurvature Effect and Beam-Induced Athermal Activation Effect
Arresting effects of nanocurvature and electron beam-induced athermal activation on the structure changes at nanoscale of free-ended amorphous SiO(x) nanowire were demonstrated. It was observed that under in situ uniform electron beam irradiation in transmission electron microscope, the near surface...
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| Publicat a: | Nanoscale Res Lett |
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| Autors principals: | , |
| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Springer US
2016
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5120135/ https://ncbi.nlm.nih.gov/pubmed/27878577 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1735-8 |
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