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Atom Diffusion and Evaporation of Free-Ended Amorphous SiO(x) Nanowires: Nanocurvature Effect and Beam-Induced Athermal Activation Effect

Arresting effects of nanocurvature and electron beam-induced athermal activation on the structure changes at nanoscale of free-ended amorphous SiO(x) nanowire were demonstrated. It was observed that under in situ uniform electron beam irradiation in transmission electron microscope, the near surface...

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Bibliografske podrobnosti
izdano v:Nanoscale Res Lett
Main Authors: Su, Jiangbin, Zhu, Xianfang
Format: Artigo
Jezik:Inglês
Izdano: Springer US 2016
Teme:
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC5120135/
https://ncbi.nlm.nih.gov/pubmed/27878577
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1735-8
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