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A Novel Nanofabrication Technique of Silicon-Based Nanostructures
A novel nanofabrication technique which can produce highly controlled silicon-based nanostructures in wafer scale has been proposed using a simple amorphous silicon (α-Si) material as an etch mask. SiO(2) nanostructures directly fabricated can serve as nanotemplates to transfer into the underlying s...
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| 出版年: | Nanoscale Res Lett |
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| 主要な著者: | , , , , , |
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer US
2016
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5110523/ https://ncbi.nlm.nih.gov/pubmed/27848239 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1702-4 |
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