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Lasing with Pumping Levels of Si Nanocrystals on Silicon Wafer
It is reported that the silicon nanocrystals (NCs) are fabricated by using self-assembly growth method with the annealing and the electron beam irradiation processes in the pulsed laser depositing, on which the visible lasing with higher gain (over 130 cm(−1)) and the enhanced emission in optical te...
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| Veröffentlicht in: | Nanoscale Res Lett |
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| Hauptverfasser: | , , , , , |
| Format: | Artigo |
| Sprache: | Inglês |
| Veröffentlicht: |
Springer US
2016
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| Schlagworte: | |
| Online Zugang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5110452/ https://ncbi.nlm.nih.gov/pubmed/27848235 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1707-z |
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