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Electrical isolation of dislocations in Ge layers on Si(001) substrates through CMOS-compatible suspended structures
Suspended crystalline Ge semiconductor structures are created on a Si(001) substrate by a combination of epitaxial growth and simple patterning from the front surface using anisotropic underetching. Geometric definition of the surface Ge layer gives access to a range of crystalline planes that have...
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| Gepubliceerd in: | Sci Technol Adv Mater |
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| Hoofdauteurs: | , , , , , , , , , |
| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
Taylor & Francis
2012
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| Onderwerpen: | |
| Online toegang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5099624/ https://ncbi.nlm.nih.gov/pubmed/27877523 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/1468-6996/13/5/055002 |
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