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Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH(3))(3)
We have characterized the structure and electrical properties of p-type nanocrystalline silicon films prepared by radio-frequency plasma-enhanced chemical vapor deposition and explored optimization methods of such layers for potential applications in thin-film solar cells. Particular attention was p...
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| Publié dans: | Sci Technol Adv Mater |
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| Auteurs principaux: | , , , , , , , , , |
| Format: | Artigo |
| Langue: | Inglês |
| Publié: |
Taylor & Francis
2012
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| Sujets: | |
| Accès en ligne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC5090560/ https://ncbi.nlm.nih.gov/pubmed/27877504 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/1468-6996/13/4/045004 |
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