Hydrogen plasma treatment of very thin p-type nanocrystalline Si films grown by RF-PECVD in the presence of B(CH(3))(3)

Por Filonovich, Sergej Alexandrovich, Águas, Hugo, Busani, Tito, Vicente, António, Araújo, Andreia, Gaspar, Diana, Vilarigues, Marcia, Leitão, Joaquim, Fortunato, Elvira, Martins, Rodrigo
Publicado no Sci Technol Adv Mater (2012)