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Controlled creation and displacement of charged domain walls in ferroelectric thin films

Charged domain walls in ferroelectric materials are of high interest due to their potential use in nanoelectronic devices. While previous approaches have utilized complex scanning probe techniques or frustrative poling here we show the creation of charged domain walls in ferroelectric thin films dur...

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Detalles Bibliográficos
Publicado en:Sci Rep
Autores principales: Feigl, L., Sluka, T., McGilly, L. J., Crassous, A., Sandu, C. S., Setter, N.
Formato: Artigo
Lenguaje:Inglês
Publicado: Nature Publishing Group 2016
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Acceso en línea:https://ncbi.nlm.nih.gov/pmc/articles/PMC4979207/
https://ncbi.nlm.nih.gov/pubmed/27507433
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep31323
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