Llwytho...
Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances
We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limit...
Wedi'i Gadw mewn:
| Cyhoeddwyd yn: | Nanoscale Res Lett |
|---|---|
| Prif Awduron: | , , , , , |
| Fformat: | Artigo |
| Iaith: | Inglês |
| Cyhoeddwyd: |
Springer US
2016
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| Pynciau: | |
| Mynediad Ar-lein: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4974215/ https://ncbi.nlm.nih.gov/pubmed/27492439 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1567-6 |
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