Optimizing Silicon Oxide Embedded Silicon Nanocrystal Inter-particle Distances

We demonstrate an analytical method to optimize the stoichiometry and thickness of multilayer silicon oxide films in order to achieve the highest density of non-touching and closely spaced silicon nanocrystals after annealing. The probability of a nanocrystal nearest-neighbor distance within a limit...

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Publicat a:Nanoscale Res Lett
Autors principals: van Sebille, Martijn, Allebrandi, Jort, Quik, Jim, van Swaaij, René A.C. M. M., Tichelaar, Frans D., Zeman, Miro
Format: Artigo
Idioma:Inglês
Publicat: Springer US 2016
Matèries:
Nano Express
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4974215/
https://ncbi.nlm.nih.gov/pubmed/27492439
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-016-1567-6
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