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Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication
It is very difficult to realize sub-3 nm patterns using conventional lithography for next-generation high-performance nanosensing, photonic, and computing devices. Here we propose a completely original and novel concept, termed self-shrinking dielectric mask (SDM), to fabricate sub-3 nm patterns. In...
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| Published in: | Sci Rep |
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| Main Authors: | , , , |
| Format: | Artigo |
| Language: | Inglês |
| Published: |
Nature Publishing Group
2016
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| Subjects: | |
| Online Access: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4940743/ https://ncbi.nlm.nih.gov/pubmed/27404325 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep29625 |
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