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Robust Pattern Transfer of Nanoimprinted Features for Sub-5 nm Fabrication
We explore the limits of a simple and facile process for transferring low aspect ratio, high resolution features defined by nanoimprint lithography. The process involves post-imprint deposition of an angle-evaporated hard mask. This widens the process window for residual resist removal and facilitat...
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| Main Authors: | , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2009
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC2761997/ https://ncbi.nlm.nih.gov/pubmed/19722536 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/nl9018512 |
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