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Deposition of Diamond Films in a Closed Hot Filament CVD System
A closed system hot filament chemical vapor deposition (CVD) reactor has been used to deposit diamond films on silicon substrates. A fixed charge of hydrogen gas is fed into the deposition system until the desired deposition pressure level is reached. A solid graphite cylindrical rod held above the...
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| Publicado no: | J Res Natl Inst Stand Technol |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
[Gaithersburg, MD] : U.S. Dept. of Commerce, National Institute of Standards and Technology
1995
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4887217/ https://ncbi.nlm.nih.gov/pubmed/29151726 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.6028/jres.100.004 |
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