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Atomic-layer soft plasma etching of MoS(2)
Transition from multi-layer to monolayer and sub-monolayer thickness leads to the many exotic properties and distinctive applications of two-dimensional (2D) MoS(2). This transition requires atomic-layer-precision thinning of bulk MoS(2) without damaging the remaining layers, which presently remains...
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| Vydáno v: | Sci Rep |
|---|---|
| Hlavní autoři: | , , , , , , , , |
| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Nature Publishing Group
2016
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4728689/ https://ncbi.nlm.nih.gov/pubmed/26813335 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep19945 |
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