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Dolutegravir-Selected HIV-1 Containing the N155H and R263K Resistance Substitutions Does Not Acquire Additional Compensatory Mutations under Drug Pressure That Lead to Higher-Level Resistance and Increased Replicative Capacity

We have previously shown that the addition of the raltegravir/elvitegavir (RAL/EVG) primary resistance mutation N155H to the R263K dolutegravir (DTG) resistance mutation partially compensated for the fitness cost imposed by R263K while also slightly increasing DTG resistance in vitro (K. Anstett, T....

詳細記述

保存先:
書誌詳細
出版年:J Virol
主要な著者: Anstett, Kaitlin, Fusco, Robert, Cutillas, Vincent, Mesplède, Thibault, Wainberg, Mark A.
フォーマット: Artigo
言語:Inglês
出版事項: American Society for Microbiology 2015
主題:
オンライン・アクセス:https://ncbi.nlm.nih.gov/pmc/articles/PMC4580168/
https://ncbi.nlm.nih.gov/pubmed/26246578
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1128/JVI.01725-15
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