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Structure and photoluminescence of the TiO(2) films grown by atomic layer deposition using tetrakis-dimethylamino titanium and ozone
TiO(2) films were grown on silicon substrates by atomic layer deposition (ALD) using tetrakis-dimethylamino titanium and ozone. Amorphous TiO(2) film was deposited at a low substrate temperature of 165°C, and anatase TiO(2) film was grown at 250°C. The amorphous TiO(2) film crystallizes to anatase T...
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| Publicado no: | Nanoscale Res Lett |
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| Main Authors: | , , , |
| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer US
2015
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4385123/ https://ncbi.nlm.nih.gov/pubmed/25852391 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/s11671-015-0790-x |
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