Carregant...

Synthesis of titanium nitride for self-aligned gate AlGaN/GaN heterostructure field-effect transistors

In this study, titanium nitride (TiN) is synthesized using reactive sputtering for a self-aligned gate process. The Schottky barrier height of the TiN on n-GaN is around 0.5 to 0.6 eV and remains virtually constant with varying nitrogen ratios. As compared with the conventional Ni electrode, the TiN...

Descripció completa

Guardat en:
Dades bibliogràfiques
Autors principals: Li, Liuan, Nakamura, Ryosuke, Wang, Qingpeng, Jiang, Ying, Ao, Jin-Ping
Format: Artigo
Idioma:Inglês
Publicat: Springer 2014
Matèries:
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4214824/
https://ncbi.nlm.nih.gov/pubmed/25364317
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-590
Etiquetes: Afegir etiqueta
Sense etiquetes, Sigues el primer a etiquetar aquest registre!