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Compositional and optical properties of SiO( x ) films and (SiO( x )/SiO( y )) junctions deposited by HFCVD
In this work, non-stoichiometric silicon oxide (SiO( x )) films and (SiO( x )/SiO( y )) junctions, as-grown and after further annealing, are characterized by different techniques. The SiO( x ) films and (SiO( x )/SiO( y )) junctions are obtained by hot filament chemical vapor deposition technique in...
Gorde:
| Egile Nagusiak: | , , , , , |
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| Formatua: | Artigo |
| Hizkuntza: | Inglês |
| Argitaratua: |
Springer
2014
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| Gaiak: | |
| Sarrera elektronikoa: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4207100/ https://ncbi.nlm.nih.gov/pubmed/25342935 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-9-422 |
| Etiketak: |
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