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Encapsulated Annealing: Enhancing the Plasmon Quality Factor in Lithographically–Defined Nanostructures

Lithography provides the precision to pattern large arrays of metallic nanostructures with varying geometries, enabling systematic studies and discoveries of new phenomena in plasmonics. However, surface plasmon resonances experience more damping in lithographically–defined structures than in chemic...

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Detalhes bibliográficos
Main Authors: Bosman, Michel, Zhang, Lei, Duan, Huigao, Tan, Shu Fen, Nijhuis, Christian A., Qiu, Cheng–Wei, Yang, Joel K. W.
Formato: Artigo
Idioma:Inglês
Publicado em: Nature Publishing Group 2014
Assuntos:
Acesso em linha:https://ncbi.nlm.nih.gov/pmc/articles/PMC4078311/
https://ncbi.nlm.nih.gov/pubmed/24986023
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep05537
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