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Encapsulated Annealing: Enhancing the Plasmon Quality Factor in Lithographically–Defined Nanostructures

Lithography provides the precision to pattern large arrays of metallic nanostructures with varying geometries, enabling systematic studies and discoveries of new phenomena in plasmonics. However, surface plasmon resonances experience more damping in lithographically–defined structures than in chemic...

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Autors principals: Bosman, Michel, Zhang, Lei, Duan, Huigao, Tan, Shu Fen, Nijhuis, Christian A., Qiu, Cheng–Wei, Yang, Joel K. W.
Format: Artigo
Idioma:Inglês
Publicat: Nature Publishing Group 2014
Matèries:
Accés en línia:https://ncbi.nlm.nih.gov/pmc/articles/PMC4078311/
https://ncbi.nlm.nih.gov/pubmed/24986023
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1038/srep05537
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