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Growth and Etch Rate Study of Low Temperature Anodic Silicon Dioxide Thin Films

Silicon dioxide (SiO(2)) thin films are most commonly used insulating films in the fabrication of silicon-based integrated circuits (ICs) and microelectromechanical systems (MEMS). Several techniques with different processing environments have been investigated to deposit silicon dioxide films at te...

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Bibliografische gegevens
Hoofdauteurs: Ashok, Akarapu, Pal, Prem
Formaat: Artigo
Taal:Inglês
Gepubliceerd in: Hindawi Publishing Corporation 2014
Onderwerpen:
Online toegang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3929520/
https://ncbi.nlm.nih.gov/pubmed/24672287
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1155/2014/106029
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