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Growth behavior of titanium dioxide thin films at different precursor temperatures

The hydrophilic TiO(2 )films were successfully deposited on slide glass substrates using titanium tetraisopropoxide as a single precursor without carriers or bubbling gases by a metal-organic chemical vapor deposition method. The TiO(2 )films were employed by scanning electron microscopy, Fourier tr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Nam, Sang-Hun, Cho, Sang-Jin, Boo, Jin-Hyo
Format: Artigo
Sprache:Inglês
Veröffentlicht: Springer 2012
Schlagworte:
Online Zugang:https://ncbi.nlm.nih.gov/pmc/articles/PMC3296554/
https://ncbi.nlm.nih.gov/pubmed/22280933
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-89
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