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A study on the characteristics of plasma polymer thin film with controlled nitrogen flow rate
Nitrogen-doped thiophene plasma polymer [N-ThioPP] thin films were deposited by radio frequency (13.56 MHz) plasma-enhanced chemical vapor deposition method. Thiophene was used as organic precursor (carbon source) with hydrogen gas as the precursor bubbler gas. Additionally, nitrogen gas [N(2)] was...
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| Autors principals: | , |
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| Format: | Artigo |
| Idioma: | Inglês |
| Publicat: |
Springer
2012
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| Matèries: | |
| Accés en línia: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3285046/ https://ncbi.nlm.nih.gov/pubmed/22221905 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-62 |
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