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Voltage distribution over capacitively coupled plasma electrode for atmospheric-pressure plasma generation
When capacitively coupled plasma (CCP) is used to generate large-area plasma, the standing wave effect becomes significant, which results in the hindering of the uniform plasma process such as in a plasma etcher or plasma chemical vapor deposition. In this study, the transmission line modeling metho...
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| Main Authors: | , , , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
Springer
2013
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3848192/ https://ncbi.nlm.nih.gov/pubmed/23634893 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-202 |
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