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Soft X-ray and Low Energy Electron Induced Damage to DNA under N(2) and O(2) Atmospheres
DNA damage induced by low energy electrons (LEEs) and soft X-rays is measured under dry nitrogen and oxygen at atmospheric pressure and temperature. Five-monolayer plasmid DNA films deposited on tantalum and glass substrates are exposed to Al K(α) X-rays of 1.5 keV in the two different environments....
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| Hoofdauteurs: | , , , |
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| Formaat: | Artigo |
| Taal: | Inglês |
| Gepubliceerd in: |
2011
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| Onderwerpen: | |
| Online toegang: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3846624/ https://ncbi.nlm.nih.gov/pubmed/21452797 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1021/jp200947g |
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