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Induction of Strand Breaks in DNA films by Low Energy Electrons and Soft X-ray under Nitrous Oxide Atmosphere
Five-monolayer (5ML) plasmid DNA films deposited on glass and tantalum substrates were exposed to Al K(α) X-rays of 1.5 keV under gaseous nitrous oxide (N(2)O) at atmospheric pressure and temperature. Whereas the damage yields for DNA deposited on glass are due to soft X-rays, those arising from DNA...
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| 主要な著者: | , |
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| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
2012
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| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC4072636/ https://ncbi.nlm.nih.gov/pubmed/24976692 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1016/j.radphyschem.2011.09.004 |
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