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Characterization of freestanding photoresist films for biological and MEMS applications
Photoresists are light-sensitive resins used in a variety of technological applications. In most applications, however, photoresists are generally used as sacrificial layers or a structural layer that remains on the fabrication substrate. Thin layers of patterned 1002F photoresist were fabricated an...
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| Main Authors: | , , |
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| Formato: | Artigo |
| Idioma: | Inglês |
| Publicado em: |
2012
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| Assuntos: | |
| Acesso em linha: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3780457/ https://ncbi.nlm.nih.gov/pubmed/24072957 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1088/0960-1317/23/2/025009 |
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