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Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography
This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si(0.4)Ge(0.6)/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift...
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| Hlavní autoři: | , , , , |
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| Médium: | Artigo |
| Jazyk: | Inglês |
| Vydáno: |
Springer
2013
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| Témata: | |
| On-line přístup: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3765112/ https://ncbi.nlm.nih.gov/pubmed/23924368 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-349 |
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