Á lódáil...
Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography
This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si(0.4)Ge(0.6)/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift...
Na minha lista:
| Main Authors: | , , , , |
|---|---|
| Formáid: | Artigo |
| Teanga: | Inglês |
| Foilsithe: |
Springer
2013
|
| Ábhair: | |
| Rochtain Ar Líne: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3765112/ https://ncbi.nlm.nih.gov/pubmed/23924368 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-349 |
| Clibeanna: |
Cuir Clib Leis
Gan Chlibeanna, Bí ar an gcéad duine leis an taifead seo a chlibeáil!
|