ロード中...
Uniform SiGe/Si quantum well nanorod and nanodot arrays fabricated using nanosphere lithography
This study fabricates the optically active uniform SiGe/Si multiple quantum well (MQW) nanorod and nanodot arrays from the Si(0.4)Ge(0.6)/Si MQWs using nanosphere lithography (NSL) combined with the reactive ion etching (RIE) process. Compared to the as-grown sample, we observe an obvious blueshift...
保存先:
| 主要な著者: | , , , , |
|---|---|
| フォーマット: | Artigo |
| 言語: | Inglês |
| 出版事項: |
Springer
2013
|
| 主題: | |
| オンライン･アクセス: | https://ncbi.nlm.nih.gov/pmc/articles/PMC3765112/ https://ncbi.nlm.nih.gov/pubmed/23924368 https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-8-349 |
| タグ: |
タグ追加
タグなし, このレコードへの初めてのタグを付けませんか!
|