A simple and fast fabrication of a both self-cleanable and deep-UV antireflective quartz nanostructured surface

Both self-cleanability and antireflectivity were achieved on quartz surfaces by forming heptadecafluoro-1,1,2,2-tetrahydrodecyltrichlorosilane self-assembled monolayer after fabrication of nanostructures with a mask-free method. By exposing polymethylmethacrylate spin-coated quartz plates to O(2) re...

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Main Authors: Kim, Jung Suk, Jeong, Hyun Woo, Lee, Wonbae, Park, Bo Gi, Kim, Beop Min, Lee, Kyu Back
Format: Artigo
Jezik:Inglês
Izdano: Springer 2012
Teme:
Nano Express
Online dostop:https://ncbi.nlm.nih.gov/pmc/articles/PMC3552822/
https://ncbi.nlm.nih.gov/pubmed/22853428
https://ncbi.nlm.nih.govhttp://dx.doi.org/10.1186/1556-276X-7-430
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